Ion-beam processing sources are intended for finish cleaning of surface of parts in vacuum, spray coating of targets with a formed beam, etching of surface of parts and applied coatings, surface polishing, assisting the coating processes.

Our company offers cold-cathode type ion sources with closed-loop electron drifting. In such ion sources, a closed-loop electron drift in crossed electric and magnetic fields, ionization of the plasma-forming gas and ion acceleration in the cathode-anode gap of a size comparable to the Larmor radius of electrons are implemented.

Fig. 1 shows a diagram of one version of an extended linear ion source.

Fig. 1 Ion source diagram 1 – water-cooled housing, 2 – high-voltage input, 3 – housing cooling input, 4 – plasma-forming gas inlet, 5 – discharge interelectrode gap, 6 – vacuum chamber walls

Characteristics of ion sources

The process of ion-plasma treatment is determined by five basic parameters:

• Energy,
• Pulse,
• Chemical composition,
• Ion mass
• Ion charge.

By combining the process parameters, it is possible to obtain a different effect from ion-plasma treatment from surface cleaning to etching and coating.

Two main versions of ion-beam sources are available:

1. Ion sources with cooling and power supply connections on the rear side (on the one side in the case of single-circuit cooling, and on two opposite sides in the case of dual-circuit cooling, Fig. 1) are connected to cooling and power supply sources using copper tubes in fluoroplastic insulation with seal assemblies designed by the ion source manufacturer.
2. Ion sources with coaxial input are characterized by the ability to simply change the position in the vacuum chamber by moving and rotating along the source axis, or by moving the source with the seal assembly to any suitable opening in the chamber. The coaxial input does not require additional electrical insulation and is electrically connected to the housing.

Ion sources can be completed with neutralization cathodes or have other design features to control the magnitude of the surface charge in the processes of cleaning, etching, target sputtering:

• Hollow cooled housing (two cooling circuits, anode and housing),
• Upgraded ion-optical system,
• Neutral magnetic field of the source,
• Charged ion compensators,
• Ion source shutter, Fig.2.
• Ion source rotation device with a coaxial input, Fig. 3.

Our ion sources have been tested by time and thousands of technological processes and are operated not only in Russia, but also in the USA, England, Hungary, Austria and other countries.

Interaction with customers begins with the selection of a technological source, selection of additional options, consultations with respect to standard process modes (ion-source treatment of glass, polycarbonate substrates and substrates from other materials) and continues in the form of source servicing.

Advantages of our ion sources:

• We provide an ion source model for design engineers and recommend the optimal target–substrate distance.
• A balanced magnetic field of the ion source makes it possible to achieve uniform treatment on long-length substrates and guarantees the absence of foreign impurities in the substrate.
• Galvanic coating of internal cooling cavities of the ion source allows to prolong service life.
• Short lead times.
• Multi-stage quality control.
• Stable behaviour over time.

Experience and professionalism of our team allows us not only to produce a standard series of ion sources, but also to conduct research and development of ion sources of various types and purposes. Currently, an extended HF ion source, a source with a neutral particle flux, a round ion source are at the design stage.

Contact our company and get an ion source that is optimally suited to your processes.